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High-sensitivity liquid-metal-based contact lens sensor for continuous intraocular pressure monitoring

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单位: [1]Huazhong Univ Sci & Technol HUST, Sch Mech Sci & Engn, Wuhan 430074, Peoples R China [2]HUST, State Key Lab Digital Mfg Equipment & Technol, Wuhan 430074, Peoples R China [3]HUST,Tongji Med Coll,Tongji Hosp,Dept Ophthalmol,Wuhan 430074,Peoples R China
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关键词: continuous IOP monitoring liquid metal ultra-flexible theoretical model high sensitivity

摘要:
Intraocular pressure (IOP) is a crucial physiological indicator for the diagnosis and treatment of glaucoma. The current infrequent IOP measurement during an office visit is insufficient to characterize the symptoms. Here, an LC resonator strain sensor in a contact lens, composed of a stretchable inductance coil using liquid metal and a chip capacitor, was developed for real-time IOP monitoring. The lens sensor was operated on the basis of 'mechanical-electrical' principle. The rising IOP will increase the curvature radius of the cornea and stretch the inductance coils through the cornea and tear film, leading to a decrease in resonant frequency. The theoretical model of the whole process has been established and explored. The sensor has been scientifically designed and fabricated to be ultra-soft, comfortable, safe without leakage and has a stable signal. The sensor was calibrated on two silicone rubber model eyeballs, respectively, showing linear and stable responses. An experiment on porcine eyes in vitro was conducted. The sensor can track IOP changes and shows much higher sensitivity than the current mainstream lens sensors, which is even an order of magnitude higher than the existing inductive sensor. The high-sensitivity and ultra-flexible liquid-metal-based lens sensor is a promising approach for 24 h continuous IOP monitoring in clinics.

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出版当年[2020]版:
大类 | 4 区 工程技术
小类 | 3 区 仪器仪表 4 区 工程:电子与电气 4 区 纳米科技 4 区 物理:应用
最新[2025]版:
大类 | 4 区 工程技术
小类 | 4 区 工程:电子与电气 4 区 仪器仪表 4 区 纳米科技 4 区 物理:应用
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出版当年[2019]版:
Q3 INSTRUMENTS & INSTRUMENTATION Q3 ENGINEERING, ELECTRICAL & ELECTRONIC Q3 PHYSICS, APPLIED Q4 NANOSCIENCE & NANOTECHNOLOGY
最新[2023]版:
Q2 ENGINEERING, ELECTRICAL & ELECTRONIC Q2 INSTRUMENTS & INSTRUMENTATION Q3 NANOSCIENCE & NANOTECHNOLOGY Q3 PHYSICS, APPLIED

影响因子: 最新[2023版] 最新五年平均 出版当年[2019版] 出版当年五年平均 出版前一年[2018版] 出版后一年[2020版]

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第一作者单位: [1]Huazhong Univ Sci & Technol HUST, Sch Mech Sci & Engn, Wuhan 430074, Peoples R China
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